濺射法制備金屬薄膜及其特性研究

應用物理學論文編號:WLX121  字數:9164,頁數:18

目  錄
中文摘要 i
英文摘要 ii
目錄 iii
第一章     緒論  1
1.1  薄膜背景介紹 1
1.2  薄膜制作工藝介紹 1
1.3  研究內容 2
第二章     濺射工藝技術  3
2.1   濺射原理與主要方式 3
2.2   工藝參數對薄膜性質的影響 4
2.3   濺射特性 5
第三章     薄膜制備及其特性研究 6
3.1   薄膜制備 6
3.2   膜的特性研究 6
   3.2.1前處理對附著性的影響 6
   3.2.2膜厚 7
   3.2.3方塊電阻 9
   3.2.4金屬膜臺階覆蓋性 11
第四章     結論 13
致謝 14
參考文獻 15

摘     要
 
 隨著市場對各種新型功能薄膜需求的日益增加，濺射技術在科學研究和工業生產領域獲得迅速發展。為了解濺射法制備金屬薄膜的過程及其特性研究,采用直流二極濺射設備在玻璃基片上鍍金膜，并對所獲得的金屬薄膜的厚度、電學性能、均勻性、重復性等進行實驗測試。使用稱重法，分析了濺射膜沉積量隨時間的變化規律,采用掃描電子顯微鏡，光學顯微鏡對金屬膜的形貌進行表征.分析薄膜的臺階覆蓋性、平整性、附著性等相關性質。 結果表明：在其它相同條件下，濺射時間和膜厚大致上呈一定的線性關系，膜厚是隨著工作時間的加長單純地呈增長趨勢，而且所制的膜均勻性并不是很好，呈中心高向四周下降的趨勢，其中心也具有較好的臺階覆蓋性。

關鍵詞：濺射 鍍膜 金屬薄膜 特性

Abstract

    With the demands of new practice function about thin films in the market,sputtering technology have a great development in scientific research and industrial manufacture field , To investigate the   preparation of thin metal films by Sputtering method and its properties. The preparation of thin metal films on glass bases by DC dipole sputtering,and test the thin metal films of thickness,electrical properties, and uniformity,repeatability. The relationship between the thickness of sputtered films and working time were analyzed using weighing method; The morphology of metal films was studied using scanning electron microscopy and Optical microscope ,analysed the thin metal films'properties, step coverage, smoothness, adhesiveness.
    The results show that on the same conditions, thickness of sputtered films and Sputtering time present the linear relationship ,Thickness of sputtered films increase simply with the increasing of  Sputtering time.Sputtered films have features that Center high around to decline and better Step coverage.

Keywords：Sputtering  Preparation of thin films  Metal film  Properties